产品分类
LPCVD卧式炉
所属分类：
CVD设备
半导体工艺设备
卧式LPCVD
概要：
LPCVD设备是半导体集成电路制造的重要设备之一，主要用于POLY, D-POLY, SiN,LP-TEOS。
关键词：
LPCVD卧式炉管设备
LPCVD卧式炉
产品概述/Product Introduction：
LPCVD设备是半导体集成电路制造的重要设备之一，主要用于POLY, D-POLY, SiN,LP-TEOS。
LPCVD equipment is one of the important equipments for semiconductor integrated circuit manufacturing.which is mainly used for the growth of LP-POLY,LP-DPOLY,LP-SiN，LP-TEOS thin films.
产品特点/Product Characteristics：
♦装载采用碳化硅(SiC)悬臂桨，避免了与工艺管磨擦产生粉尘
Silicon carbide (SiC) cantilever paddle is used for loading, which avoids dust generated by friction with process pipe
♦温度控制采用串级控制方式，对基片实际温度进行实时智能控制
The temperature control adopts cascade control mode, and the real-time intelligent control of the actual temperature of the substrate is carried out
♦工作压力闭环自动控制，提高工艺稳定性和重复性
Closed-loop automatic control of chamber pressure improves process stability and repeatability
♦可根据客户需求配置多工艺组合的机台
Multi-process combination of machines according to customer demand
技术指标/Technical Indicators：
♦晶片尺寸：6-8英寸 Wafer size: 6-8 inch wafer
♦制程温度范围：500°C-1000°C Process temperature range: 500°C-1000°C
♦恒温区长度：≥800mm Length of constant temperature zone: ≥ 800 mm
♦控温精度：±1°C Temperature control accuracy: ±1°C
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