产品分类
MPCVD长晶炉
所属分类：
金刚石单晶生长设备
概要：
本设备主要是用于制备单晶金刚石?？杉し⒏呶榷ǘ鹊牡壤胱油?，从而确保单晶生长的持续性，为合成大尺寸单晶金刚石提供有力保证。
关键词：
MPCVD长晶炉
MPCVD长晶炉
产品概述/Product Introduction：
本设备主要是用于制备单晶金刚石?？杉し⒏呶榷ǘ鹊牡壤胱油?，从而确保单晶生长的持续性，为合成大尺寸单晶金刚石提供有力保证。
The equipment is mainly used forthe preparation of single crystal diamond.It can excite the plasma cluster with high stability, thus ensuring the continuity of single crystal growth and providing a strong guarantee for the synthesis of large-size single crystal diamond.
产品特点/Product Characteristics：
♦ 制程温度范围:300-1500℃ Temperature process range: 300-1500C
♦ 气路系统:6路 Gas path system: 6 channels
♦ 微波功率:6-12Kw连续可调 Microwave power: 6-12Kw continuously adjustable
♦ 波纹:≤1% Ripple:≤1%
♦ 微波泄露值:＜5Mw/cm2 Microwaveleakagevalue:<5Mw/cm²
♦ 沉积区域:≥100mm Deposition area:≥100 mm
♦ 极限真空:≤10Pa Limit vacuum:≤10Pa
♦ 压力范围:5-300Torr Pressure range: 5-300 Torr
♦ 功率稳定性:＜2% Power stability:<2%
♦ 微波频率:2.45GHz土50MHz Microwave frequency:2.45GHz ± 50MHz
♦ 放电区域:≥100mm Discharge area:≥100mm
♦ 生长速率:>10um Growth rate:>10um
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